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What is Plasma Sources Science and Technology mean?
Plasma Sources Science and Technology is an international journal dedicated solely to non-fusion aspects of plasma science.
The Journal was founded in 1992 by Professor Noah Hershkowitz of the University of Wisconsin–Madison who also served as Editor-in-Chief until 2007. Mark J. Kushner of the Michigan Institute for Plasma Science and Engineering, University of Michigan took over the leadership of the journal until 2013 when Professor Bill Graham, Queen's University Belfast, became Editor-in-Chief. Professor Graham was followed by Professor Uwe Czarnetzki, Ruhr University Bochum, who became Editor-in-Chief in 2017. Professor Czarnetzki is actively involved in the peer-review of every paper.
The journal is indexed in Scopus, INSPEC Information Services, ISI (SciSearch, ISI Alerting Services, Current Contents/Physical, Chemical and Earth Sciences), Chemical Abstracts, INIS Atomindex (International Nuclear Information System), NASA Astrophysics Data System, PASCAL Database, Article@INIST, Engineering Index/Ei Compendex, Cambridge Scientific Abstracts (Environmental Engineering Abstracts, Bioengineering Abstracts), and VINITI Abstracts Journal.
referencePosted on 30 Apr 2022, this text provides information on Miscellaneous in Technology related to Technology. Please note that while accuracy is prioritized, the data presented might not be entirely correct or up-to-date. This information is offered for general knowledge and informational purposes only, and should not be considered as a substitute for professional advice.
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